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Yijie Liu
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Journal Articles

A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

Yijie Liu, Zhen Zhang
Journal: Journal of Mechanical Design
Article Type: Research Papers
J. Mech. Des. April 2022, 144(4): 043303.
Paper No: MD-21-1359
DOI: https://doi.org/10.1115/1.4053462
Published Online: February 15, 2022
View Article titled, A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography
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Topics: Design, Electron beams, Manipulators, Stiffness, Optimization, Compliant mechanisms, Lithography, Displacement
Proceedings Papers

A Larger Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

Yijie Liu, Zhen Zhang
Proc. ASME. IDETC-CIE2021, Volume 7: 17th IEEE/ASME International Conference on Mechatronic and Embedded Systems and Applications (MESA), V007T07A040, August 17–19, 2021
Paper No: DETC2021-69770
DOI: https://doi.org/10.1115/DETC2021-69770
View Paper titled, A Larger Range Compliant Nano-Manipulator Supporting Electron Beam Lithography
Open the PDF for A Larger Range Compliant Nano-Manipulator Supporting Electron Beam Lithography in another window
Topics: Electron beams, Lithography, Manipulators, Cathode ray oscilloscopes, Design, Errors, Optimization, Vacuum