We are developing calibration artifacts for mesoscale metrology (especially vision probing) by using silicon bulk micromachining. We evaluate these artifacts on both high accuracy coordinate measuring machines (CMMs) and on typical production vision-based measurement systems. This will improve the accuracy of vision-based measurement equipment used in production. Successful realization of these mesoscale artifacts will enhance both production metrology capabilities and reduce manufacturing costs.
- Manufacturing Engineering Division
Design of a Silicon Micromachined Artifact for Hybrid Dimensional Measurement
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Oliver, AD, Tran, HD, & Claudet, AA. "Design of a Silicon Micromachined Artifact for Hybrid Dimensional Measurement." Proceedings of the ASME 2006 International Manufacturing Science and Engineering Conference. Manufacturing Science and Engineering, Parts A and B. Ypsilanti, Michigan, USA. October 8–11, 2006. pp. 809-814. ASME. https://doi.org/10.1115/MSEC2006-21095
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