A method for the construction of high density (2.4 mm−2) vertical leads through a pyrex substrate is presented. The pyrex substrate behaves as a TCE (Thermal Coefficient of Expansion) matched interposer that permits anodic bonding of silicon micromirrors on one side and flip-chip bumping of multiplexing electronic chips on its opposite side. Electrical leads consist of 250±25 μm-diameter holes formed by AJM machining and coated with evaporated Au yielding via resistances of 0.5–0.7 Ω. The via holes are sealed with a new spin-cast polyimide tenting process that enables the subsequent patterning of multiple levels of metal using conventional lithographic techniques.

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