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Proceedings Papers

A Larger Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

Yijie Liu, Zhen Zhang
Proc. ASME. IDETC-CIE2021, Volume 7: 17th IEEE/ASME International Conference on Mechatronic and Embedded Systems and Applications (MESA), V007T07A040, August 17–19, 2021
Paper No: DETC2021-69770
DOI: https://doi.org/10.1115/DETC2021-69770
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Topics: Electron beams, Lithography, Manipulators, Cathode ray oscilloscopes, Design, Errors, Optimization, Vacuum
Proceedings Papers

Design Considerations for Manufacturability of MEMS Comb Actuators

Hrishikesh Dixit, Dean L. Taylor, Srikanth Kannapan
Proc. ASME. DETC-CIE96, Volume 1: Design for Manufacturing Conference, V001T01A047, August 18–22, 1996
Paper No: 96-DETC/DFM-1311
DOI: https://doi.org/10.1115/96-DETC/DFM-1311
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Topics: Actuators, Design, Design for Manufacturing, Microelectromechanical systems, Manufacturing, Parametric design, Chemical vapor deposition, Etching, Integrated circuits, Lithography
Proceedings Papers

Partially Constrained Compliant Stages for High Resolution Imprint Lithography

B. J. Choi, S. Johnson, S. V. Sreenivasan, M. Colburn, T. Bailey, C. G. Willson
Proc. ASME. IDETC-CIE2000, Volume 7B: 26th Biennial Mechanisms and Robotics Conference, 861-870, September 10–13, 2000
Paper No: DETC2000/MECH-14145
DOI: https://doi.org/10.1115/DETC2000/MECH-14145
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Topics: Lithography, Resolution (Optics), Design, Errors, Kinematics, Machinery, Optics, Photolithography, Separation (Technology), Shear (Mechanics)
Proceedings Papers

Enhancement of Stereo-Lithography Technology to Support Building Around Inserts

Brad Geving, Imme Ebert-Uphoff
Proc. ASME. IDETC-CIE2000, Volume 7B: 26th Biennial Mechanisms and Robotics Conference, 1399-1408, September 10–13, 2000
Paper No: DETC2000/MECH-14207
DOI: https://doi.org/10.1115/DETC2000/MECH-14207
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Topics: Lithography, Manufacturing, Robotics, Actuators, Machinery, Sensors, Computer-aided design, Lasers, Photopolymers, Rapid prototyping
Proceedings Papers

Development of a Compact and Cost Effective MSL System Based on a Compliant Nanomanipulator

Zheng Liu, Zhen Zhang, Yingchun Guan
Proc. ASME. IDETC-CIE2019, Volume 9: 15th IEEE/ASME International Conference on Mechatronic and Embedded Systems and Applications, V009T12A040, August 18–21, 2019
Paper No: DETC2019-97522
DOI: https://doi.org/10.1115/DETC2019-97522
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Topics: Lasers, Light sources, Lithography, Manufacturing
Proceedings Papers

A Capacitive MEMS Pressure Sensor With Wavy Membrane and Linear Capacitance-Pressure Response

Stephen Oke, Mohammad Shavezipur
Proc. ASME. IDETC-CIE2019, Volume 4: 24th Design for Manufacturing and the Life Cycle Conference; 13th International Conference on Micro- and Nanosystems, V004T08A011, August 18–21, 2019
Paper No: DETC2019-98021
DOI: https://doi.org/10.1115/DETC2019-98021
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Topics: Capacitance, Membranes, Microelectromechanical systems, Pressure, Pressure sensors, Design, Shapes, Deformation, Electrodes, Cavities
Proceedings Papers

Electrostatically Tunable Nanomechanical Shallow Arches

Syed N. R. Kazmi, Amal Z. Hajjaj, Pedro M. F. J. Costa, Mohammad I. Younis
Proc. ASME. IDETC-CIE2017, Volume 4: 22nd Design for Manufacturing and the Life Cycle Conference; 11th International Conference on Micro- and Nanosystems, V004T09A011, August 6–9, 2017
Paper No: DETC2017-67845
DOI: https://doi.org/10.1115/DETC2017-67845
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Topics: Arches, Silicon-on-insulator, Cathode rays, Electrodes, Electron beams, Filtration, Lithography, Semiconductor wafers, Silicon, Temperature
Proceedings Papers

Double-Layer Nerve Guide Conduit With Palisade Poly(Lactic-Co-Glycolic Acid) Tube Wrapped by Microporous Chitosan-Collagen Composite

Ching-Wen Li, Gou-Jen Wang
Proc. ASME. IDETC-CIE2017, Volume 4: 22nd Design for Manufacturing and the Life Cycle Conference; 11th International Conference on Micro- and Nanosystems, V004T09A001, August 6–9, 2017
Paper No: DETC2017-67109
DOI: https://doi.org/10.1115/DETC2017-67109
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Topics: Composite materials, PLGA, Membranes, Water absorption, Biocompatibility, Biological tissues, Brain, Drying, Lithography, Stem cells
Proceedings Papers

Data-Driven Simulation for Fast Prediction of Pull-Up Process in Bottom-Up Stereo-Lithography

Jun Wang, Sonjoy Das, Chi Zhou, Rahul Rai
Proc. ASME. IDETC-CIE2016, Volume 1A: 36th Computers and Information in Engineering Conference, V01AT02A035, August 21–24, 2016
Paper No: DETC2016-59723
DOI: https://doi.org/10.1115/DETC2016-59723
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Topics: Lithography, Simulation, Shapes, Separation (Technology), Stress concentration, Artificial neural networks, Finite element analysis, Finite element model, Materials properties, Databases
Proceedings Papers

A Cascade Microfluidic Device for High Quality Mitochondria Extraction

Ching-Wen Li, Pao-Hsin Yen, Gou-Jen Wang
Proc. ASME. IDETC-CIE2015, Volume 4: 20th Design for Manufacturing and the Life Cycle Conference; 9th International Conference on Micro- and Nanosystems, V004T09A001, August 2–5, 2015
Paper No: DETC2015-46117
DOI: https://doi.org/10.1115/DETC2015-46117
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Topics: Cascades (Fluid dynamics), Microfluidics, Diseases, Patient treatment, Proteins, Damage, Geometry, Hardening (Curing), Lithography, Maintenance
Proceedings Papers

Effect of Adaptive Slicing on Surface Integrity in Additive Manufacturing

S. Sikder, Ahmad Barari, H. A. Kishawy
Proc. ASME. IDETC-CIE2014, Volume 1A: 34th Computers and Information in Engineering Conference, V01AT02A052, August 17–20, 2014
Paper No: DETC2014-35559
DOI: https://doi.org/10.1115/DETC2014-35559
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Topics: Additive manufacturing, Algorithms, Computer-aided design, Errors, Lithography, Machinery, Uncertainty
Proceedings Papers

Integrating CAD and Nano-Indentation for Complex Lithography

Kangmin Xu, Seung-Cheol Yang, Xiaoping Qian
Proc. ASME. IDETC-CIE2012, Volume 2: 32nd Computers and Information in Engineering Conference, Parts A and B, 439-447, August 12–15, 2012
Paper No: DETC2012-71548
DOI: https://doi.org/10.1115/DETC2012-71548
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Topics: Computer-aided design, Lithography, Nanoindentation, Atomic force microscopy, Geometry, B-splines, Computer software, Design, Machining, Nanolithography
Proceedings Papers

A Framework for Concurrent Consideration in Advanced Product Development Technology Selection

P. J. Farrugia, E. Francalanza, K. Coppini
Proc. ASME. IDETC-CIE2011, Volume 2: 31st Computers and Information in Engineering Conference, Parts A and B, 567-576, August 28–31, 2011
Paper No: DETC2011-47176
DOI: https://doi.org/10.1115/DETC2011-47176
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Topics: Product development, Manufacturing, Appropriate technology, Engineering prototypes, Lasers, Lithography, Machinery, Modeling, Product design, Rapid prototyping
Proceedings Papers

Non-Cleanroom Fabrication of Carbon Nanotube-Based MEMS Force and Displacement Sensors

Michael A. Cullinan, Robert M. Panas, Cody R. Daniel, Joshua B. Gafford, Martin L. Culpepper
Proc. ASME. IDETC-CIE2011, Volume 7: 5th International Conference on Micro- and Nanosystems; 8th International Conference on Design and Design Education; 21st Reliability, Stress Analysis, and Failure Prevention Conference, 425-431, August 28–31, 2011
Paper No: DETC2011-47945
DOI: https://doi.org/10.1115/DETC2011-47945
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Topics: Carbon, Displacement, Manufacturing, Microelectromechanical systems, Nanotubes, Sensors, Carbon nanotubes, Wire, Bending (Stress), Tungsten
Proceedings Papers

Parametric Analysis of Irradiance Distribution in Proximity Printing of Micro Circular and Annulus Apertures

Jhy-Cherng Tsai, Guei-Si Sie, Jhy-Wei Fan
Proc. ASME. IDETC-CIE2010, Volume 4: 12th International Conference on Advanced Vehicle and Tire Technologies; 4th International Conference on Micro- and Nanosystems, 803-809, August 15–18, 2010
Paper No: DETC2010-28648
DOI: https://doi.org/10.1115/DETC2010-28648
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Topics: Annulus, Printing, Diffraction, Photoresists, Diffraction patterns, Helium-neon lasers, Lithography, Microscale devices, Simulation, Theorems (Mathematics)
Proceedings Papers

A Lab-on-a-Chip Capillary Network for Red Blood Cell Diagnosis

Gou-Jen Wang, Guo-Yang Chen, Yan-Cheng Lin
Proc. ASME. IDETC-CIE2009, Volume 6: ASME Power Transmission and Gearing Conference; 3rd International Conference on Micro- and Nanosystems; 11th International Conference on Advanced Vehicle and Tire Technologies, 409-414, August 30–September 2, 2009
Paper No: DETC2009-87299
DOI: https://doi.org/10.1115/DETC2009-87299
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Topics: Erythrocytes, Blood, Blood flow, Carbon dioxide, Circuits, Diseases, Fluids, Hydrodynamics, Lithography, Modeling
Proceedings Papers

Agent-Based Micro Machining System With Cusp-Height-Minimized Tool Sequence

Kyung-Hoon Wie, Hyung-Jung Kim, Young-Sun Hong, Sung-Hoon Ahn
Proc. ASME. IDETC-CIE2009, Volume 2: 29th Computers and Information in Engineering Conference, Parts A and B, 571-578, August 30–September 2, 2009
Paper No: DETC2009-86951
DOI: https://doi.org/10.1115/DETC2009-86951
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Topics: Micromachining, Machining, Multi-agent systems, Cutting tools, Databases, Design, Engineers, Finishing, Grinding, Lithography
Proceedings Papers

Stitching Technology Using Hybrid Actuators in Nano Imprint

Cheng-Hung Chen, Jia-Yush Yen, Lien-Sheng Chen, Shuo-Hung Chang
Proc. ASME. IDETC-CIE2008, Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems, 683-687, August 3–6, 2008
Paper No: DETC2008-49260
DOI: https://doi.org/10.1115/DETC2008-49260
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Topics: Actuators, Diffraction gratings, Integrated circuits, Interferometers, Lasers, Lithography, Nanotechnology, Periodic structures, Printing, Resolution (Optics)
Proceedings Papers

Enabling Soft Lithography Using an Atomic Force Microscope

Matthew S. Johannes, Daniel G. Cole, Robert L. Clark
Proc. ASME. IDETC-CIE2008, Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems, 749-757, August 3–6, 2008
Paper No: DETC2008-49877
DOI: https://doi.org/10.1115/DETC2008-49877
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Topics: Atomic force microscopy, Lithography, Nanoscale phenomena, Anisotropy, Design, Etching, Molding, Nanolithography, Nanostructures , Silicon
Proceedings Papers

Robust Design of Flexure Based Nano Precision Compliant Mechanisms With Application to Nano Imprint Lithography

Chinmaya B. Patil, S. V. Sreenivasan, Raul G. Longoria
Proc. ASME. IDETC-CIE2008, Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems, 701-711, August 3–6, 2008
Paper No: DETC2008-50114
DOI: https://doi.org/10.1115/DETC2008-50114
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Topics: Bending (Stress), Compliant mechanisms, Design, Lithography, Flexure mechanisms, Errors, Machining, Optimization, Calibration, Screws