Simulation of Surface Chemistry in CVD Technologies: A Detailed Deposition Model With Surface Diffusion

Modern electronics relies on high quality semiconductor materials. For thin films used in solar cells and flat panel displays, the key issues are the precise composition and spatial uniformity. Modeling and simulation are indispensable for optimizing the technologies of semiconductor film production, such as chemical vapor deposition (CVD), plasma enhanced CVD and hot-wire CVD. Multiphysics simulations of electromagnetic dynamics coupled with the flow of reacting gases, plasma discharge and deposition processes, allowed us to optimize large-scale plasma chemical reactors [1] and to find other solutions to complex industrial applications [2,3].