In this paper, we present a new thermal reflow method to transform photresist pillars into the shapes of spherical caps and month-eyes. We also investigated the effect of this sub-wavelength structure morphology on anti-reflection properties of these photoresist patterns. The diameter, the height, and the pitch of this regularly arranged pillar array were set at 200, 250, and 340 nm, respectively. After the thermal reflow, experimental results showed that the reflectivity of the heat-treated photoresist patterns can be reduced to approximately one fourth of that of the polished surface of the silicon wafer.
- Design Engineering Division and Computers in Engineering Division
The Effect of Sub-Wavelength Structure Morphology on Anti-Reflection Properties
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Lin, H, Tsai, J, Chang, S, Wu, T, & Wei, M. "The Effect of Sub-Wavelength Structure Morphology on Anti-Reflection Properties." Proceedings of the ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems. Brooklyn, New York, USA. August 3–6, 2008. pp. 689-693. ASME. https://doi.org/10.1115/DETC2008-49647
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